Patent · US Expired

Method for manufacturing fine-grained silicon monoxide

US5096685A · kind A · utility

12Cited by
7References
24Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 27, 1990
Grant dateMar 17, 1992
Priority date
Expiry dateJul 27, 2010

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01P2006/80
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A system for manufacturing fine-grained SiO powder includes means for heating a mixture of an SiO.sub.2 containing material and an Si and/or C containing material for generating SiO vapor, and for condensing the generated SiO vapor from a gaseous state in the presence of non-oxidizing gas and under substantially low pressure. Preferably, vacuum is maintained at the position where thermal reaction generates SiO vapor. Non-oxidizing gas serves for transferring vapor-state SiO and/or fine-grained SiO powder to an SiO collection chamber. This successfully prevents the SiO from being accumulated within a transfer pipe or duct and thus prevents the pipe or duct from being blocked. Furthermore, substantially low pressure (vacuum) atmosphere encourages SiO vapor generation from the reagent mixture and thus permits a lower heating temperature to cause SiO vapor generation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.