High speed apparatus for forming capacitors
US5097800A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 10, 1990 |
| Grant date | Mar 24, 1992 |
| Priority date | — |
| Expiry date | Jul 10, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01G13/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A high speed apparatus for forming capacitors includes a vacuum chamber in which is located a carrier defining a continuous surface configured to move at a rate of from about 150 feet per minute to about 600 feet per minute during the forming operation, a metal depositing device, a dielectric depositing device, and a radiation source. The metal depositing device is configured to deposit layers of metal onto the moving surface, and the dielectric depositing device includes (a) a device for atomizing a radiation-curable polyfunctional acrylic monomer to form liquid droplets of the monomer, (b) a heated surface on which the atomized monomer droplets impinge and are flash vaporized, and (c) device for thereafter condensing the flash-vaporized monomer on the metal layers to form a monomer coating on successive layers. The radiation source is positioned for curing successive monomer coatings after each such coating has been deposited, to thereby form a polymer dielectric layer. Apparatus are provided for controlling each of the devices so that metal is deposited, a monomer coating is deposited, and the monomer coating is cured to form the polymer dielectric layer before the continuous su…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.