Method and apparatus for cleaning semiconductor devices
US5100476A · kind A · utility
37Cited by
5References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 27, 1990 |
| Grant date | Mar 31, 1992 |
| Priority date | — |
| Expiry date | Mar 27, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67051
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus for cleaning semiconductor devices has a mixing section for mixing a chemical solution with pure water. A semiconductor substrate to be cleaned is placed on a support. An ultrasonic generator applies ultrasonic vibrations to the supplied pure water. The mixing section mixes a predetermined chemical solution with the pure water applied with the ultrasonic vibrations and supplies a desired pure water solution onto the semiconductor substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.