Apparatus for forming thin film
US5100526A · kind A · utility
19Cited by
7References
4Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 24, 1991 |
| Grant date | Mar 31, 1992 |
| Priority date | — |
| Expiry date | Jan 24, 2011 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/221
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for forming a thin film includes a vacuum chamber; an exhaust system for evacuating the vacuum chamber and a crucible for generating, in the vacuum chamber, clusters of a deposit substance. The apparatus for forming a thin film further includes an ionizing device for ionizing part of the clusters generated by the crucible; an acceleration device for accelerating ionized clusters to collide with a substrate retained in the vacuum chamber; and a filter for removing ionized clusters smaller than a predetermined size.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.