Patent · US Expired

Process for purifying hydrogen fluoride

US5100639A · kind A · utility

6Cited by
3References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 22, 1991
Grant dateMar 31, 1992
Priority date
Expiry dateFeb 22, 2011

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01B7/196
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A process for manufacturing high purity anhydrous hydrogen fluoride (HF) having low levels of oxidizable impurities by electrolytically oxidizing the impurities. Specifically, trivalent arsenic impurity in the anhydrous hydrogen fluoride is oxidized to a non-volatile pentavalent arsenic compound. The resultant mixture is distilled to recover high purity anhydrous hydrogen fluoride with low levels of arsenic impurity.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.