Resin acid esters based on novolak oxyalkylates, their preparation and their use
US5100989A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 1, 1988 |
| Grant date | Mar 31, 1992 |
| Priority date | — |
| Expiry date | Sep 1, 2008 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K23/42
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The invention relates to surface-active compounds of the general formula (I) ##STR1## in which Ar is an aromatic system which is optionally substituted by C.sub.1 -C.sub.18 -alkyl, C.sub.1 -C.sub.18 -alkoxy, C.sub.2 -C.sub.5 -alkanoyl, C.sub.6 -C.sub.10 -aryl, (C.sub.6 -C.sub.10 -aryl)-C.sub.1 -C.sub.4 -alkyl, A has the formula --(X--O).sub.n --Y, wherein n denotes 1 to 50, X denotes ethylene or methylethylene and all or some of Y denote an acyl radical of a non-modified or modified natural resin acid and the other radicals Y denote radicals from the group comprising hydrogen, acyl radicals of saturated C.sub.1-24 -carboxylic acids, unsaturated C.sub.3-24 -carboxylic acids, C.sub.2-24 -hydroxy-fatty acids or C.sub.8-18 -alkyl-, -alkenyl- and -alkylidene-succinic acids, maleic acid, fumaric acid, sulfosuccinic acid, sulfuric acid, benzodicarboxylic acids and C.sub.1-16 -n-alkanedicarboxylic acids, W is a group --CHR-- or --CHR--N(R*)--T--N(R*)--CHR--, wherein R*is hydrogen, C.sub.1 -C.sub.4 -alkyl, C.sub.2 -C.sub.4 -hydroxyalkyl, a radical A or --C.sub.2 -C.sub.4 -alkylene-O--A and R is H or C.sub.1-9 -alkyl, T is C.sub.2 -C.sub.12 -alkylene, which is optionally interrupted by --O--…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.