Method of manufacturing silicon optical fiber having a compressive surface layer
US5102438A · kind A · utility
2Cited by
14References
4Claims
0Family size
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Key dates
| Filing date | Jan 22, 1988 |
| Grant date | Apr 7, 1992 |
| Priority date | — |
| Expiry date | Jan 22, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S65/90
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
In order to eliminate the effect of water attack on silica optical fibres, the fibres are provided with a surface layer of silicon nitride or silicon oxynitride. The method proposed includes direct nitridation. This may be achieved by adding a nitriding atmosphere to the drawing furnace gases, or to the reactive gases (TiCl.sub.4 and SiCl.sub.4) incorporated in the flame of an oxyhydrogen torch for the formation of a compressive silica/titania layer on an optical fibre by a glass soot deposition and sintering process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.