Patent · US Expired

Arrangement for the production of a plasma

US5102523A · kind A · utility

59Cited by

7References

12Claims

0Family size

Assignee

Leybold GmBH · DE

Inventors

Siegfried Beisswenger · Alzenau, DE
Barbara Beichler · Rodgau, DE
Michael Geisler · Apolda, DE
Stefan Reineck · Langgöns, DE

Key dates

Filing date	Oct 25, 1990
Grant date	Apr 7, 1992
Priority date	—
Expiry date	Oct 25, 2010

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/32532
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The invention relates to an arrangement for the production of a plasma as well as for applying charged and uncharged particles onto a substrate. Two areal electrodes connected to a voltage source are provided between which a plasma volume excited by high-frequency energy is ignited. The areal ratio of the two electrodes is variable in order to influence the energy of the ions impinging on a substrate. Furthermore, supplying of process gas distributed over the entire substrate area is possible.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.