Photosensitive materials
US5102771A · kind A · utility
44Cited by
3References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 26, 1990 |
| Grant date | Apr 7, 1992 |
| Priority date | — |
| Expiry date | Nov 26, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/038
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Photosensitive compositions containing a photoinitiator which generates an acid upon exposure to light and a polymer containing pendant alkoxy alkyl ester groups. Also disclosed are imageable articles containing the photosensitive compositions of the present invention coated on a substrate as well as processes for forming an imaged article.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.