Polymeric mixtures and process therefor
US5102924A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 16, 1990 |
| Grant date | Apr 7, 1992 |
| Priority date | — |
| Expiry date | Aug 16, 2010 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09D4/00
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A tough polymeric mixture comprises the polymerized product of admixture I or II, wherein PA1 admixture I comprises 5 to 45 weight percent of a first monomer and a photoinitiator therefor, said first monomer being at least one free-radically polymerizable monomer, and 95 to 55 weight percent of a second monomer and a photoinitiator therefor, said second monomer being at least one set of polyurethane precursors, and PA1 admixture II comprises 5 to 45 weight percent of a first monomer and a photoinitiator therefor, said first monomer being at least one set of polyurethane precursors, and 95 to 55 weight percent of a second monomer and a photoinitiator therefor, said second monomer being at least one free-radically polymerizable monomer, PA1 said polymeric mixture having been prepared by a process involving two sequential actinic radiations of wavelengths ranges centered around .lambda..sub.1 and .lambda..sub.2, respectively, wherein .lambda..sub.1 and .lambda..sub.2 differ from each other by at least 30 nm, and PA1 wherein the actinic radiation centered .lambda..sub.1 does not substantialy polymerize the second monomer, and PA1 wherein the area under a stress-strain curve as determin…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.