Diffusion plasma-assisted chemical treatment apparatus
US5105761A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 15, 1990 |
| Grant date | Apr 21, 1992 |
| Priority date | — |
| Expiry date | Oct 15, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32357
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The apparatus comprises a tight treatment enclosure (10), means (20,22) for the axial production of a carrier gas plasma, a solid plate (30) serving as an obstacle to the plasma and located perpendicular to the enclosure axis and downstream of the plasma production means, plasma diffusion means (40) located downstream of the obstacle plate, several non-ionized vector gas supply tubes (50) issuing axially into the enclosure beneath the diffusion means and all located in the same plane around the enclosure axis, a substrate carrier (56) positioned downstream of the vector gas supply tubes and perpendicular to the axis and annular pumping means (66,16) for the gaseous medium contained in the enclosure and positioned downstream of the substrate carrier.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.