Support and seal structure for CCVD reactor
US5105762A · kind A · utility
5Cited by
20References
11Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 22, 1991 |
| Grant date | Apr 21, 1992 |
| Priority date | — |
| Expiry date | Mar 22, 2011 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/54
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Reaction gases are prevented from escaping from a reaction chamber through the use of flexible or gas seals between the interface of the reaction chamber and the junction used to connected successive reaction chambers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.