Patent · US Expired

Process for purifying hydrogen fluoride

US5108559A · kind A · utility

5Cited by
12References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 1, 1990
Grant dateApr 28, 1992
Priority date
Expiry dateOct 1, 2010

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01B7/196
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A process for manufacturing high purity anhydrous hydrogen fluoride (HF) having low levels of oxidizable impurities by electrolytically oxidizing the impurities. Specifically, trivalent arsenic impurity in the anhydrous hydrogen fluoride is oxidized to a non-volatile pentavalent arsenic compound. The resultant solution is distilled to recover high purity anhydrous hydrogen fluoride with low levels of arsenic impurity.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.