Patent · US Expired

Vacuwipe

US5109565A · kind A · utility

3Cited by
2References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 20, 1991
Grant dateMay 5, 1992
Priority date
Expiry dateFeb 20, 2011

Classification

  • Technology area (CPC D)Textiles; Paper
  • CPC primaryD07B7/16
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A method and apparatus for removing liquid residues from the surface of a continuously advancing strand or filament by using a plurality of vacuum probes positioned such that they continuously expose the entire surface of such advancing strand or filament to a greatly reduced pressure thereby removing substantially all of such residues from the strand's or filament's surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.