Patent · US Expired

I-line radiation-sensitive alkali-soluble resin composition utilizing 1,2-quinone diazide compound and hydroxy-chalcone additive

US5110706A · kind A · utility

82Cited by

1References

4Claims

0Family size

Assignee

Japan Synthetic Rubber Corporation · JP

Inventors

Yoshiji Yumoto · Yokohama, JP
Tsutomu Shimokawa · Tokyo, JP
Takao Miura · Yokkaichi, JP

Key dates

Filing date	Nov 13, 1990
Grant date	May 5, 1992
Priority date	—
Expiry date	Nov 13, 2010

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/0226
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A radiation-sensitive resin composition comprises (a) an alkali-soluble resin, (b) a 1,2-quinone diazide compound, and (c) an aromatic compound having a specified molecular structure, as essential constituents. The composition is extremely useful for forming a positive type photoresist on a substrate having a high reflectance.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.