Method for replacing a deposit shield in an evacuated film forming chamber
US5112185A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Sep 6, 1991 |
| Grant date | May 12, 1992 |
| Priority date | — |
| Expiry date | Sep 6, 2011 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/54
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A film forming apparatus for forming a film on a substrate set inside a film forming chamber capable of being evacuated comprises; a film forming chamber in which a film is formed on a substrate; a deposit shield member to prevent deposits from being adhered on the inner wall surface of the film forming chamber; a vacuum chamber capable of being evacuated and in which the deposit shield member is changed for new one; an open-shut device provided between the vacuum chamber and the film forming chamber, to keep airtightness between the vacuum chamber and the film forming chamber; and a carrying device to carry the deposit shield member between the vacuum chamber and the film forming chamber. Deposit shield members are changed while a vacuum is maintained continuously in the film forming chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.