Organometallic compounds
US5112432A · kind A · utility
11Cited by
11References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 3, 1989 |
| Grant date | May 12, 1992 |
| Priority date | — |
| Expiry date | Aug 3, 2009 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/40
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a process for the production of thin films and epitaxial layers by gas-phase deposition, intramolecularly stabilized organometallic compounds are employed as a source of metal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.