Wafer transfer method in vertical CVD diffusion apparatus
US5112641A · kind A · utility
21Cited by
10References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 18, 1990 |
| Grant date | May 12, 1992 |
| Priority date | — |
| Expiry date | Jan 18, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/141
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A wafer transfer method and mechanism in a vertical CVD diffusion apparatus and a control device for the method and mechanism. The vertical-type CVD diffusing apparatus has a boat containing many wafers in a horizontal orientation, stacked vertically. Product wafers are transferred to the boat five by five, dummy wafers are transferred five by five or a fraction less than five, and monitor wafers are inserted one by one between a block of the product wafers and another block of the product wafers, or a block of the dummy wafers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.