Diffraction grating apparatus and method of forming a surface relief pattern in diffraction grating apparatus
US5113286A · kind A · utility
56Cited by
5References
35Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 27, 1990 |
| Grant date | May 12, 1992 |
| Priority date | — |
| Expiry date | Sep 27, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/1871
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A phase diffraction grating apparatus which is usable to generate an array of N spots, where n is an even integer, and the N spots are substantially equally spaced. The generation of an even number of spots is achieved using a translation symmetry in the grating design. Illustratively, the intensities of the N spots are substantially equal. Binary, multi-level, and continuous phase grating embodiments are disclosed. In the case of the multi-level and continuous embodiments, the uniform intensity is obtained using a reflection symmetry in the grating design.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.