Solid state laser device for lithography light source and semiconductor lithography method
US5113402A · kind A · utility
5Cited by
5References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 21, 1990 |
| Grant date | May 12, 1992 |
| Priority date | — |
| Expiry date | Sep 21, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/354
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A non-linear optical material is used to convert a solid state laser ray of light output of a first wavelength into light of a shorter wavelength. The light output of shorter wavelength is suitable for use as a light source for lithography. Wavelengths as short as those obtained by excimer laser devices can be achieved. When the light source is used in lithography, the degree of integration of ICs for the new generation of 16MDRAM can be achieved more safely and simply than possible with excimer lasers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.