Apparatus for grinding semiconductor wafer
US5113622A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 19, 1991 |
| Grant date | May 19, 1992 |
| Priority date | — |
| Expiry date | Aug 19, 2011 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B55/02
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
An apparatus is provided for grinding a semiconductor wafer, which includes a table having a work stage on which a semiconductor wafer to be ground is placed, at least the work stage being rotatable about an axis, and a grinding wheel which is movable in a direction perpendicular to or parallel to the work stage while being rotated about an axis parallel to the rotational axis of the work stage. In this apparatus, a semiconductor wafer is cooled during grinding. In order to perform cooling, the apparatus has an inlet flow path for guiding cooling liquid to a grinding surface of the grinding wheel, and an outlet flow path for collecting the cooling liquid which flows onto the work stage. The apparatus also includes a temperature detector, disposed in the outlet flow path, for detecting a temperature of the recovered cooling liquid. A rotational speed of the grinding wheel or the rotary table is controlled based on the temperature of the cooling liquid detected by the temperature detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.