Polishing composition for metallic material
US5114437A · kind A · utility
28Cited by
7References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 27, 1991 |
| Grant date | May 19, 1992 |
| Priority date | — |
| Expiry date | Aug 27, 2011 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23F3/00
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A polishing composition for metallic materials, which comprises water, an alumina polishing agent, and a polishing accelerator, wherein the polishing accelerator is at least one selected from the group consisting of chromium(III) nitrate, lanthanum nitrate, ammonium cerium(III) nitrate, and neodymium nitrate. The polishing composition has a high polishing efficiency and provides a good surface smoothness.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.