Method for gas-aided dispensing of liquid materials
US5114752A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Dec 21, 1990 |
| Grant date | May 19, 1992 |
| Priority date | — |
| Expiry date | Dec 21, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05D11/132
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for depositing liquid material onto a workpiece in the form of a deposit having a desired conformation wherein the material is discharged under pressure from the nozzle of a dispensing gun which can be manipulated by a robot to lay the deposit according to a programmed pattern on the workpiece. One or more gas jets are directed toward the material after the material is discharged from the nozzle to impart a desired conformation to the material deposited on the workpiece. The flow rate of the gas jets is controlled in accordance with the liquid flow rate to maintain substantial uniformity of the conformation of the deposit. The flow rate of the gas jets may also be controlled with reference to a tool speed signal which varies according to the relative speed between the nozzle and the workpiece as well as an auxiliary signal the latter of which can be used to selectively alter the conformation of the deposit. The invention further provides a system for avoiding disruption of a desired conformation due to irregularities in the manner liquid material is pumped to the dispensing gun by sensing occurrence of the irregularity and adjusting the flow rate of the gas jets in timed r…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.