Ion source
US5115135A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 2, 1990 |
| Grant date | May 19, 1992 |
| Priority date | — |
| Expiry date | Mar 2, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J27/24
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ion source includes a partial flow generator for generating particle flow including atoms or molecules, a laser beam generator for generating a laser beam with one or a plurality of wavelengths which irradiates the whole or one part of the atoms or molecules in the particle flow near an exhaust nozzle of the particle flow generator, a pair of electrodes for applyinig an electric field over one part or the whole of the particle flow in the downstream region of the region irradiated with the laser beam, and a power supply for applying a voltage to generate the electric field between the electrodes to the electrodes. Wherein the laser has one or a plurality of excitation wavelengths for exciting specific atoms or molecules in the particle flow from a ground state to a highly excited state, that is, the Rydberg state in which the principal quantum number of a valence electron is large, a voltage for generating an electric field more than the minimum electric field for ionizing the atoms or molecules in the Rydberg state is applied between the electrodes after irradiation of the laser beam, and one or a plurality of outlet holes through which an ion beam is drawn out are provided at …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.