Method and apparatus for applying a coating material to a substrate
US5116250A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 19, 1988 |
| Grant date | May 26, 1992 |
| Priority date | — |
| Expiry date | Sep 19, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6715
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A coating apparatus comprises a spinning chuck rotatably supported within an enclosure and securely holding a substrate thereon. A coating material is applied onto the surface of the substrate and distributed over the substrate by centrifugal forces. An annular air duct is disposed in surrounding and spaced relation to the spinning chuck, and a disk is placed between the air duct and the spinning chuck and has a plurality of guide vanes. Fans are provided in the air duct to develop a positive flow of air over the substrate. The flow of air is guided by the guide vanes in a direction identical to the direction of rotation of the substrate so as to eliminate undesirable deposition from the end edges of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.