Method for fabricating an angled diffraction grating
US5116461A · kind A · utility
82Cited by
1References
20Claims
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Assignee
Inventors
Key dates
| Filing date | Apr 22, 1991 |
| Grant date | May 26, 1992 |
| Priority date | — |
| Expiry date | Apr 22, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/1857
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for fabricating an angled diffraction grating (12) is provided. An optical medium (13) with fine lines and spaces that are defined in an etch mask is provided. Transferring the defined lines and spaces of the etch mask into the optical medium (13) at a desirable angle is achieved by an etching means, thereby resulting in an angled diffraction grating (12).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.