Patent · US Expired

Having a protective film of a polymer having a fluorine-containing aliphatic cyclic structure

US5117272A · kind A · utility

42Cited by
3References
23Claims
0Family size

Assignees

Inventors

Key dates

Filing dateApr 16, 1990
Grant dateMay 26, 1992
Priority date
Expiry dateApr 16, 2010

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/12044
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A semiconductor integrated circuit device having a protective film made of a polymer having a fluorine-containing aliphatic cyclic structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.