Positive and negative working radiation sensitive mixtures and production of relief patterns

US5118585A · kind A · utility

Assignee

• BASF SE

Inventors

• Reinhold Schwalm · Monsheim, DE
• Horst Binder · Lampertheim, DE

Key dates

• Filing date: Jul 22, 1991
• Grant date: Jun 2, 1992
• Expiry date: Jul 22, 2011

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/0045
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Positive and negative working radiation sensitive mixtures suitable in particular for producing relief patterns contain a polymeric binder and an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and also an additional group which upon irradiation forms a strong acid, the polymeric binders being reaction products of polymers that contain phenolic hydroxyl groups with dihydropyran or with alkyl vinyl ethers.