Blend of silicate and photocurable arylsiloxane materials
US5118742A · kind A · utility
1Cited by
12References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 3, 1990 |
| Grant date | Jun 2, 1992 |
| Priority date | — |
| Expiry date | Apr 3, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Good quality films can be formed on a substrate by coating a substrate with a solution comprising a liquid silicate solvent containing a dissolved photocurable arylsiloxane oligomer or polymer. Phenyl silocane/silicate compositions can be used to form photocurable films on substrates for use as dielectric films, protective coatings, and the like.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.