Patent · US Expired

Method of producing a substrate plate for a liquid crystal cell with black matrix areas

US5120623A · kind A · utility

11Cited by
1References
4Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 7, 1990
Grant dateJun 9, 1992
Priority date
Expiry dateDec 7, 2010

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/40
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method of producing a substrate plate for a liquid crystal cell with black matrix areas in which blackened polymer material is already deposited before the structured areas of photosensitive resist overlying the structured electrode areas are removed. Rather, these structured areas of photosensitive resist are removed only after the blackened polymer material has been hardened. This processing sequence has the advantage that no special alignment processes are needed in order to arrange the black matrix areas accurately between the electrode areas. This alignment is obtained autonomously by virtue of the fact that the electrode areas, even after they have been structured with the help of the photosensitive resist areas, are still covered by these selfsame photosensitive resist areas, thereby ensuring in an ideal manner that only the areas between the electrode areas will be filled with black matrix material and this in such a way as to make them butt directly against the electrode areas, so that the maximum possible surface will be covered by black matrix material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.