Lithography system employing a solid immersion lens
US5121256A · kind A · utility
588Cited by
3References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 14, 1991 |
| Grant date | Jun 9, 1992 |
| Priority date | — |
| Expiry date | Mar 14, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70825
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithography system employing a solid immersion lens having a spherical surface to enhance its resolution is disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.