Patent · US Expired

Finely divided, precipitated silica with high structure, method of its preparation and use

US5123964A · kind A · utility

16Cited by
6References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 16, 1991
Grant dateJun 23, 1992
Priority date
Expiry dateMay 16, 2011

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01P2006/82
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

Finely divided precipitated silica with high structure and a ______________________________________ BET surface (DIN 66 132) of 150 to 350 m.sup.2 /g Stamping density (DIN 53 194) between 60 and 120 g/l DBP number between 3.0 and 4.0 ml/g Particle size distribution at least 70% from 1 to 6 .mu.m ______________________________________ can be prepared by heating a mixture of water and sodium silicate under agitation to a temperature of 70.degree. to 80.degree. C., adding concentrated sulfuric acid into this mixture until half of the alkali present has been neutralized, shearing the reaction mixture and optionally raising the temperature at the same time to 86.+-.5.degree. C. Concentrated sulfuric acid is added after a period of 30 to 120 minutes at a rather high rate until the pH of the silica suspension produced is 3.0 to 3.5, the silica suspension is optionally diluted with water, the coarse portion optionally separated by a centrifugal pump and a hydrocyclone, the silica filtered off by known filter devices, the silica filter cake washed free of sulfate, the silica filter cake redispersed with the addition of water by an agitator unit to a suspension with a solid content of 80.+-.…

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.