High accuracy, high flexibility energy beam machining system
US5124522A · kind A · utility
Inventors
Key dates
| Filing date | Jul 23, 1990 |
| Grant date | Jun 23, 1992 |
| Priority date | — |
| Expiry date | Jul 23, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/0017
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A high precision system for machining substrates by means of an energy beam includes real time digital signal processor control and a deflection system providing control, within a predetermined field of the substrate, of the angle at which the beam machines the substrate. An electron beam is used in a vacuum chamber in a preferred embodiment. The system also includes an x-y table for positioning the substrate and may have provision for detecting the x-y position and angular misregistration of the substrate. Dynamic forms and stigmator control may be used to produce a uniform beam within the field. The system allows a high speed vector machining process, which optimizes the overall system throughput by minimizing the settling time of the deflection system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.