Fe-Ni alloy sheet for shadow mask and method for manufacturing same
US5127965A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 1, 1991 |
| Grant date | Jul 7, 1992 |
| Priority date | — |
| Expiry date | Jul 1, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2229/0733
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An Fe-Ni alloy sheet for a shadow mask, which consists essentially of: PA0 nickel: from 34 to 38 wt. %, PA0 silicon: from 0.01 to 0.15 wt. %, PA0 manganese: from 0.01 to 1.00 wt. %, and PA0 the balance being iron and incidental impurities; PA0 the surface portion of the alloy sheet having a silicon (si) segregation rate, as expressed by the following formula, of up to 10%: ##EQU1## and the alloy sheet having a surface roughness which satisfies all the following formulae (1) to (3): EQU 0.3 .mu.m.ltoreq.Ra.ltoreq.0.8 .mu.m (1) PA0 where, Ra: center-line mean roughness; EQU 3.ltoreq.Rkr.ltoreq.7 (2) PA0 where, Rkr: kurtosis which is a sharpness index in the height direction of the roughness curve; and ##EQU2## The above-mentioned alloy sheet is manufactured by: preparing an alloy sheet, which has the above-mentioned chemical composition, and imparting a surface roughness which satisfies all the above-mentioned formulae (1) to (3) to the both surfaces of the alloy sheet by means of a pair of dull rolls during the final rolling of the alloy sheet for that preparation. The thus manufactured alloy sheet is excellent in etching pierceability and free from seizure of the flat mask during t…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.