Method of manufacturing titanium magnetic disk substrate
US5131995A · kind A · utility
8Cited by
2References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 28, 1991 |
| Grant date | Jul 21, 1992 |
| Priority date | — |
| Expiry date | Feb 28, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/73919
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
After the surface roughness of a titanium substrate is set to be R.sub.max .ltoreq.0.08 .mu.m, a hardened layer having a hardness of H.sub.v .gtoreq.250 is formed thereon to have a thickness of 50 to 250 .mu.m by sputtering, thereby manufacturing a titanium magnetic disk substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.