Sputtering apparatus
US5135635A · kind A · utility
15Cited by
1References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 29, 1991 |
| Grant date | Aug 4, 1992 |
| Priority date | — |
| Expiry date | Mar 29, 2011 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/56
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
The sputtering apparatus for the present invention is used for manufacturing optical discs. On loading and unloading of disc substrates to and from a vacuum chamber, a disc entrance and exit opening provided on the vacuum chamber is closed by a tray having an opening at the center thereof on which the disc substrate is placed and a push up rod having a closing side closing the opening of the tray on the lower side thereof. Sealing of the disc entrance and exit opening may be made positive and the vacuum chamber is uniformly evacuated so that an excellent sputtering can be performed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.