Heat pipe susceptor for epitaxy
US5136978A · kind A · utility
14Cited by
13References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 30, 1989 |
| Grant date | Aug 11, 1992 |
| Priority date | — |
| Expiry date | Oct 30, 2009 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B25/10
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention is a heat pipe susceptor for use in a vapor deposition system. The multi-layered refractory material susceptor provides a highly uniform heated surface upon which wafers are placed for heating by a radio frequency (RF) source. Because of the highly uniform surface temperature, susceptors are able to hold a plurality of inch sized diameter wafers and the shape of the surfaces can be designed as the need arises. A cylindrically shaped top and a multi-faced frustum shaped top are examples.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.