Preparation of photosensitive material to withstand a lamination process
US5138469A · kind A · utility
8Cited by
40References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 26, 1989 |
| Grant date | Aug 11, 1992 |
| Priority date | — |
| Expiry date | Jun 26, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31565
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for processing exposed holograms to enhance their thermal stability and enable them to withstand a windshield lamination process is disclosed. The secondary processing procedure entails an optional step of applying a moisture barrier to the hologram, followed by heat stabilizing the hologram and storing it in a relatively low humidity environment. Specifically, the exposed holographic material is heated to a peak temperature of about 135.degree. C. and thereafter cooled to provide a thermally stabilized holographic material that maintains its holographic qualities over a relatively broad range of temperatures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.