Controlled thallous oxide evaporation for thallium superconductor films and reactor design
US5139998A · kind A · utility
5Cited by
10References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 27, 1990 |
| Grant date | Aug 18, 1992 |
| Priority date | — |
| Expiry date | Apr 27, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S505/786
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods and reactors are described for the production of thallium cuprate based high temperature superconductor films on a variety of substrates. The reactors provide for low volume cavities, means for rapidly heating and cooling to and from a predetermined elevated temperature and control of the thallium oxide overpressure during the processing. Uniform high temperature superconducting films are obtained while inhibiting reaction between the substrate and superconducting film during the processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.