Method of preparing a photo-mask for imaging three-dimensional objects
US5141829A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 10, 1990 |
| Grant date | Aug 25, 1992 |
| Priority date | — |
| Expiry date | Sep 10, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/056
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for the preparation a photo-mask used for photo-imaging selected areas on the surfaces of a three-dimensional printed circuit board substrate. The photo-mask comprises a membrane transparent and degradation resistant to UV light, having at least one side with a contoured shape conforming, and flexible enough to comply with surface irregularities on the surfaces of the three-dimensional substrate being photo-imaged. A pattern of tracks opaque to UV light is posiitoned along the contoured shape of the membrane. The pattern of tracks on the photo-mask is in accordance with a desired conductive metal trace pattern on the surfaces of the three-dimensional printed circuit board substrate. The photo-mask is prepared by photo-imaging and then depositing a track material on a film that conformed to the surfaces of the three-dimensional substrate. An adhesive layer applied over the film cements a membrane material poured upon the adhesive layer. Once the membrane material sets into the membrane it is sepaarated from the substrate to form the photo-mask of the present invention.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.