Contact cooling of a projection mask
US5142120A · kind A · utility
11Cited by
7References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 21, 1990 |
| Grant date | Aug 25, 1992 |
| Priority date | — |
| Expiry date | Dec 21, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70875
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus and method for cooling a large-area, pass-through projection mask for excimer ablation. In a preferred embodiment, a laser-transparent window is spaced apart from the projection mask to provide a thermal escape path. The thermal escape path receives a liquid flow which is in direct contact with patterned masking material of the projection mask. The liquid, preferably deionized water, is caused to flow in a laminar fashion. The liquid intersects the laser energy of the excimer laser. In a second embodiment, the liquid flow is along the periphery of the patterned masking material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.