Stereolithography method and apparatus
US5143663A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 12, 1989 |
| Grant date | Sep 1, 1992 |
| Priority date | — |
| Expiry date | Jun 12, 2009 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29C71/04
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
An improved stereolithographic apparatus and method is described. In one embodiment, the improvement includes immersing at least a portion of a part in a volume of a liquid solvent in a vapor degreaser while subjecting the portion to ultrasonic agitation to substantially remove excess resin. Several examples of solvents are provided, including ethanol, and Freon TMS. In a second embodiment, the improvement includes building the part on a layer of liquid resin supported by a volume of a dense, immiscible, and UV transparent intermediate liquid, and integratably immersing at least a portion of the built part in the intermediate liquid, and then either subjecting the immersed portion to ultrasonic agitation to substantially remove excess resin, or subjecting the immersed portion to UV light. Several examples of intermediate liquids are provided, including perfluorinated fluids, such as Fluorinert FC-40, and water-based salt solutions, such as solutions of magnesium sulfate or sodium chloride in water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.