Formation and high resolution patterning of superconductors
US5143894A · kind A · utility
14Cited by
3References
12Claims
0Family size
Inventors
Key dates
| Filing date | Aug 16, 1989 |
| Grant date | Sep 1, 1992 |
| Priority date | — |
| Expiry date | Aug 16, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S505/742
Abstract
A method is disclosed for forming a patterned oxide superconducting film wherein a selected region of a ternary metal oxide superconducting film is irradiated in a controlled atmosphere with photons so as to become non-superconductive.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.