Positive photoresist composition
US5145763A · kind A · utility
21Cited by
17References
37Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 29, 1990 |
| Grant date | Sep 8, 1992 |
| Priority date | — |
| Expiry date | Jun 29, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0226
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive photoresist composition containing (i) a quinone diazide polymer formed by reacting a cresol-formaldehyde novolac resin and an o-quinonediazide compound, and (ii) a sulfonamide development enhancement agent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.