Patent · US Expired

Positive working resist compositions process of exposing, stripping developing

US5145764A · kind A · utility

11Cited by

8References

28Claims

0Family size

Assignee

E.I. DU PONT DE NEMOURS AND COMPANY · US

Inventors

Richard Bauer · Estacada, US
Gwendyline Y. Y. Chen · Wilmington, US
Walter R. Hertler · Kennett Square, US
Robert Clayton Wheland · Wilmington, US

Key dates

Filing date	Sep 10, 1991
Grant date	Sep 8, 1992
Priority date	—
Expiry date	Sep 10, 2011

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/039
WIPO fieldOptics
WIPO sectorInstruments

Abstract

This invention relates to positive working resist compositions having utility in dry film photoresists and to fully aqueous methods for developing and stripping them.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.