Method of cleaning a surface
US5147465A · kind A · utility
6Cited by
8References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 30, 1990 |
| Grant date | Sep 15, 1992 |
| Priority date | — |
| Expiry date | Oct 30, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32357
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of cleaning a surface including generating helium ions, electrons, and metastable helium by exciting helium gas, separating said metastable helium from the helium ions and electrons, and exposing a substance to be processed on the surface of which foreign matter is present to the metastable helium separated from the helium ions and electrons to remove the foreign matter from the substance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.