Delay composition and device
US5147476A · kind A · utility
6Cited by
3References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 12, 1991 |
| Grant date | Sep 15, 1992 |
| Priority date | — |
| Expiry date | Mar 12, 2011 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC06B33/00
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A delay device or detonator contains a delay composition comprising a consolidated, particulate mixture of silicon and a suitable oxidant, and a minor effective proportion of dispersed metal compound intimately incorporated therewith to serve as a reaction facilitating flux, and the metal compound may be selected from alkali metal salts such as sodium chloride, sodium sulphate, potassium sulphate; lead monoxide, oxides of antimony such as Sb.sub.2 O.sub.3, or Sb.sub.2 O.sub.5, vanadium e.g. V.sub.2 O.sub.5 or mixtures thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.