Process and apparatus for drying a liquid film applied to a moving substrate

US5147690A · kind A · utility

Assignee

• Hoechst GmbH · DE

Inventors

• Horst Faust · Wiesbaden, DE
• Guenter Hultzsch · Wiesbaden, DE
• Reinhard Nies · Wiesbaden, DE

Key dates

• Filing date: Aug 22, 1990
• Grant date: Sep 15, 1992
• Expiry date: Aug 22, 2010

Classification

• Technology area (CPC F): Mechanical Engineering; Lighting; Heating
• CPC primary: F26B13/104
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

An apparatus for drying a liquid film on a substrate web which includes a lower gas or air supply system and an upper gas or air supply system. The substrate strip is subjected to a flow of hot supply air (or gas) without mechanical support of guide elements, which air (or gas) forms a carrying cushion and at the same time supplies drying energy to the liquid layer applied to the substrate. The exhaust air (or exhaust air) is carried away through return channels. Slots for the gas or air supply and the return channels for the gas or air removal are arranged alternately in the lower gas or air supply system. The upper gas or air supply system has a greater width than the lower gas or air supply system. In the upper gas or air supply systen, the supply air or the gas is diverted by baffles onto the substrate and returned over the substrate web as return air or gas. The upper gas or air supply system is subdivided into sections for the supply air and exhaust air or the inflowing gas and outflowing gas, each section including two filter plates of porous material.