Organometallic compounds
US5149853A · kind A · utility
2Cited by
2References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 8, 1991 |
| Grant date | Sep 22, 1992 |
| Priority date | — |
| Expiry date | Nov 8, 2011 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/40
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a process for the production of thin films and epitaxial layers by gas-phase deposition, intramolecularly stabilized organometallic compounds are employed as a source of metal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.