Process for manufacturing an optical recording medium
US5151295A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 18, 1990 |
| Grant date | Sep 29, 1992 |
| Priority date | — |
| Expiry date | Oct 18, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B7/26
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method of depositing the layers of an optical recording medium to their requisite thicknesses is disclosed in which optical monitoring of the reflectivity of a first dielectric layer during deposition is used to determine the deposition rate. The reflectivity is monitored to determine the time period in which the reflectivity reaches a maximum or minimum value, which occurs when the layer is a quarter wave thick. The deposition rate is derived from that time period, and the deposition is continued for a time in accordance with the deposition rate until the requisite thickness of the first dielectric layer is obtained. The second dielectric layer is deposited for a lesser time period in accordance with the deposition rate which has been optically derived during deposition of the first dielectric layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.